2023 The journal of adhesive denti…

Three-year Clinical Performance of a Universal Adhesive in Non-Carious Cervical Lesions.

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The journal of adhesive dentistry Vol. 25 : 133-146 • Jun 2023

PURPOSE: The aim of this randomized controlled clinical trial was to evaluate the 3-year clinical performance of a universal adhesive (Clearfil Universal Bond Quick (CUBQ); Kuraray Noritake) when restoring non-carious cervical lesions (NCCLs) using two different application modes (etch-and-rinse vs self-etch with prior selective enamel etching). MATERIALS AND METHODS: Fifty-one patients participated in this study. A total of 251 NCCLs (n = 251) were assigned to two groups: 1) CUBQ applied in etch-and-rinse mode (n = 122; CUBQ-ER) and 2) CUBQ applied in self-etch mode with prior selective etching of enamel with phosphoric acid (n = 129; CUPQ-SEE). The same resin composite, Clearfil Majesty ES-2 (Kuraray Noritake), was used for all restorations. The restorations were evaluated at baseline, 1 and 3 years using FDI criteria: marginal staining, fracture and retention, marginal adaptation, post-operative sensitivity and recurrence of caries. Statistical analysis was performed using a logistic regression model with generalized estimating equations (2-way GEE model). RESULTS: The patient recall rate at 3 years was 90%. After 3 years, both groups presented an increase in the percentage of small but still clinically acceptable marginal defects (CUBQ-ER: 67%, CUBQ-SEE: 63.2%) and marginal staining (CUBQ-ER: 32.6%, CUBQ-SEE: 31.7%). The overall success rate was 82.6% and 83.8% for CUBQ-ER and CUBQ-SEE, respectively. In total, 38 restorations (19 CUBQ-ER, 19 CUBQ-SEE) failed because of loss of retention, fracture, severe marginal defect and/or marginal discoloration. A retention rate of 87.2% and 86.3% was recorded for CUBQ-ER and CUBQ-SEE, respectively. No significant difference was observed between the two bonding-mode groups for any of the evaluated parameters. CONCLUSION: After 3 years of clinical service, Clearfil Universal Bond Quick performed similarly in etch-and-rinse and self-etch modes with prior selective enamel etching.

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